Plasma damage-free deposition of Al cathode on organic light-emitting devices by using mirror shape target sputtering

Applied Physics Letters

Volumn 85, Issue 19, 2004, Pages 4295-4298

  Kim, Han Ki ^a   Kim, D G ^a   Lee, K S ^a   Huh, M S ^a   Jeong, S H ^a   Kim, K I ^a   Kim, H ^a   Han, D W ^a   Kwon, J H ^a  

^a Samsung SDI   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CATHODES; DEPOSITION; LEAKAGE CURRENTS; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; MIRRORS; PLASMA APPLICATIONS;

ENERGETIC PARTICLES; MIRROR SHAPE TARGET SPUTTERING (MSTS); ORGANIC LIGHT-EMITTING DEVICES (OLED); PLASMA DAMAGE;

LIGHT EMITTING DIODES;

EID: 10844224447     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1815394     Document Type: Conference Paper

References (11)

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