On the stability of MIMO EWMA run-to-run controllers with metrology delay

IEEE Transactions on Semiconductor Manufacturing

Volumn 19, Issue 1, 2006, Pages 78-86

  Good, Richard P ^a,b  

^a Advanced Process Control Group   (Germany)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

Exponentially weighted moving average (EWMA); Measurement delay; Run to run control; Stability

Indexed keywords

EIGENVALUES AND EIGENFUNCTIONS; MATRIX ALGEBRA; MEASUREMENTS; SEMICONDUCTOR DEVICE MANUFACTURE; SYSTEM STABILITY;

MEASUREMENT DELAY; QUALITY MEASUREMENTS; RUN-TO-RUN CONTROL;

CONTROL EQUIPMENT;

EID: 33144454409     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2005.863211     Document Type: Conference Paper

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