|
|
Volumn , Issue , 2002, Pages 107-112
|
|
Shallow trench isolation run-to-run control project at infineon technologies richmond
a
|
|
Author keywords
DRAM; Etch; Run to run; Shallow trench isolation
|
|
Indexed keywords
ALGORITHMS;
DYNAMIC RANDOM ACCESS STORAGE;
FEEDBACK CONTROL;
MAGNETIC VARIABLES CONTROL;
REACTIVE ION ETCHING;
STATISTICAL PROCESS CONTROL;
UNCERTAIN SYSTEMS;
WSI CIRCUITS;
ETCH DEPTH CONTROL;
MAGNETICALLY ENHANCED REACTIVE ION ETCH;
RUN-TO-RUN ALGORITHMS;
SHALLOW TRENCH ISOLATION CONTROL;
WAFER-TO-WAFER DEPTH VARIATION;
SEMICONDUCTOR DEVICE MANUFACTURE;
|
|
EID: 0036076319
PISSN: 1523553X
EISSN: None
Source Type: Journal
DOI: 10.1109/ASMC.2002.1001584 Document Type: Article |
|
Times cited : (6)
|
|
References (1)
|
