X-ray diffuse scattering from stacking faults in Czochralski silicon

Semiconductor Science and Technology

Volumn 21, Issue 3, 2006, Pages 352-357

  Klang, P ^a   Holy V ^a  

^a MASARYK UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL GROWTH; DIFFUSION; ELASTICITY; STACKING FAULTS; X RAY SCATTERING;

CZOCHRALSKI SILICON; INTENSITY DISTRIBUTION; INTENSITY STREAKS; SILICON CRYSTALS;

SILICON WAFERS;

EID: 32844459417     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/21/3/025     Document Type: Article

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