Analytic analysis on asymmetrical micro arcing in high plasma potential RF plasma systems

Plasma Sources Science and Technology

Volumn 15, Issue 1, 2006, Pages 99-104

  Yin, Y ^a   McKenzie, D R ^a   Bilek, M M M ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC CURRENTS; ELECTRIC FIELDS; ELECTRODES; FREQUENCIES; PLASMA APPLICATIONS;

ANALYTIC MODEL; MICRO ARCING; PARTICLE-IN-CELL SIMULATION; POWERED ELECTRODE;

PLASMAS;

EID: 32844455884     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/15/1/015     Document Type: Article

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