Microarcing instability in RF PECVD plasma system

Surface and Coatings Technology

Volumn 198, Issue 1-3 SPEC. ISS., 2005, Pages 379-383

  Yin, Y ^a   Bilek, M M M ^a   McKenzie, D R ^a   Boswell, R W ^b   Charles, C ^b  

^a UNIVERSITY OF SYDNEY   (Australia)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Langmuir probe; Microarcing; RF plasma system

Indexed keywords

ELECTRIC CHARGE; ELECTRIC POTENTIAL; PLASMA SHEATHS; REACTIVE ION ETCHING;

GAS PRESSURE; LANGMUIR PROBES; MICROARCINGS; PLASMA POTENTIAL; PLASMA SYSTEMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CHEMICAL VAPOR DEPOSITION;

EID: 20744453544     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.10.089     Document Type: Article

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