Enhancement of microarcing at a grounded chamber wall by nonvanishing ion sheath in a radio-frequency capacitive discharged plasma

Applied Physics Letters

Volumn 87, Issue 18, 2005, Pages 1-3

  Kwok, Dixon T K ^a   Yin, Yongbai ^a   Bilek, Marcela M M ^a   McKenzie, David ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; ELECTRODES; IONS;

DISCHARGED PLASMA; EMISSION ELECTRONS; GROUNDED CHAMBER WALL; ION SHEATH;

PLASMAS;

EID: 27344440128     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2126126     Document Type: Article

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