Dry etching characteristics of ITO thin films deposited on plastic substrates

Thin Solid Films

Volumn 383, Issue 1-2, 2001, Pages 281-283

  Lee, Y J ^a   Bae, J W ^a   Han, H R ^a   Kim, J S ^a   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPOSITION EFFECTS; DRY ETCHING; INDIUM COMPOUNDS; PHOTORESISTS; PLASMAS; PLASTICS; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

INDUCTIVELY COUPLED PLASMAS (ICP);

MAGNETIC THIN FILMS;

EID: 0035246789     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01578-9     Document Type: Article

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