OES study of the plasma during CVD diamond growth using CCl4/H2/O2 mixtures

Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 368-372

  Ferreira, N G ^a   Corat, E J ^a,b   Trava Airoldi, V J ^a,b   Leite, N F ^a  

^a INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

^b UNIVERSIDADE SÃO FRANCISCO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON TETRACHLORIDE; COMPOSITION EFFECTS; DISSOCIATION; EMISSION SPECTROSCOPY; FILM GROWTH; HYDROCARBONS; HYDROGEN; MASS SPECTROMETRY; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY;

OPTICAL EMISSION SPECTROSCOPY (OES);

DIAMOND FILMS;

EID: 0033738632     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(99)00337-4     Document Type: Article

References (17)

1. W.A. Weimer, F.M. Cerio, C.E. Johnson, J. Mater. Res. 6 (10) (1991) 2134.
2. E.J. Corat, V.J. Trava-Airoldi, N.F. Leite, M.C.A. Nono, V. Baranauskas, J. Mater. Res. 32 (1997) 0001.
3. S.J. Harris, A.M. Weiner, J. Appl. Phys. 67 (1990) 6520.
4. P.K. Bachmann, H.J. Hagemann, H. Lade, D. Leers, F. Picht, D.U. Wiechert, H. Wilson, Mater. Res. Soc. Symp. Proc. 339 (1994) 267.
5. M. Asmann, J. Heberlein, E. Pfender, Diamond Relat. Mater. 8 (1999) 1.
6. R.C. Mendes de Barros, E.J. Corat, V.J. Trava-Airoldi, N.G. Ferreira, N.F. Leite, K. Iha, Diamond Relat. Mater. 6 (1997) 490.
7. N.G. Ferreira, E.J. Corat, V.J. Trava-Airoldi, N.F. Leite, R.C. Mendes de Barros, Diamond Relat. Mater. 6 (1997) 472.
8. N.G. Ferreira, E.J. Corat, V.J. Trava-Airoldi, N.F. Leite, E. Del Bosco, Diamond Relat. Mater. 7 (1998) 81.
9. N.G. Ferreira, E.J. Corat, V.J. Trava-Airoldi, N.F. Leite, Diamond Relat. Mater. 7 (1998) 272.
10. I. Schimidt, C. Benndorf, Diamond Relat. Mater. 7 (1998) 266.
11. L. St-Onge, M. Moisan, Plasma Chem. Plasma Process. 14 (2) (1994) 87.
12. J. Warnatz, Rate coefficients in the C-H-O system, in: W.C.J. Gardiner (Ed.), Combustion Chemistry, Springer-Verlag, New York, 1984, p. 233. Chapter 5.
13. W.D. Cassidy, E.A. Evans, Y. Wang, J.C. Angus, P.K. Backmann, H.J. Hagemann, D. Leers, D.U. Wiechert, Mater. Res. Soc. Symp. Proc. 339 (1994) 285.
14. M. Allan, S.F. Wong, J. Chem. Phys. 74 (3) (1981) 1687.
15. G. Knoth, M. Gote, M. Rädle, K. Jung, H. Ehrhardt, Phys. Rev. Lett. 62 (15) (1989) 1735.
16. J.A. Mucha, D.L. Flamm, D.E. Ibbotson, J. Appl. Phys. 65 (9) (1989) 3448.
17. R.J. Nemanichi, J.T. Glass, G. Lucovisky, R.E. Shroder, J. Vac. Sci. Technol. A 6 (1988) 1783.