Atmospheric pressure chemical vapour deposition of selenium films by KrF laser photolysis of dimethyl selenium

Applied Surface Science

Volumn 172, Issue 3-4, 2001, Pages 220-224

  Pola, Josef ^a   Bastl, Zdeněk ^b   Šubrt, Jan ^c   Ouchi, Akihiko ^d  

^a INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^b J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^c INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

^d NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; GAS LASERS; HELIUM; PHOTOLYSIS; SEMICONDUCTING SELENIUM; THERMOANALYSIS;

LASER-INDUCED PHOTOLYSIS;

SEMICONDUCTING FILMS;

EID: 0034832041     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00851-5     Document Type: Article

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