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Volumn 5, Issue SUPPL. 1, 2000, Pages
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Hydride vapour phase homoepitaxlal growth of GaN on MOCVD-grown 'templates'
a a a a b b a a c c a
c
AIXTRON AG
(Germany)
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Author keywords
[No Author keywords available]
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Indexed keywords
CARRIER CONCENTRATION;
EPITAXIAL GROWTH;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
NUCLEATION;
SAPPHIRE;
THICKNESS MEASUREMENT;
DEFECT STRUCTURES;
EDGE DISLOCATIONS;
HYDRIDES VAPOR PHASE HOMOEPITAXIAL GROWTH (HVPE);
UNDOPED LAYERS;
GALLIUM NITRIDE;
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EID: 3242776967
PISSN: 10925783
EISSN: None
Source Type: Journal
DOI: None Document Type: Conference Paper |
Times cited : (15)
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References (12)
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