Photomask Cr-MoSi etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 3, 2004, Pages 1150-1159

  Wu, Banqiu ^a  

^a PHOTRONICS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; INTERFACES (MATERIALS); OPTIMIZATION; PHASE TRANSITIONS; PLASMA ETCHING; PROFILOMETRY; RAW MATERIALS;

ETCH KINETICS; ETCH TOOLS; LASER LITHOGRAPHY; PHASE SHIFT MASKS;

MASKS;

EID: 3242700616     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1755216     Document Type: Article

References (9)

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2. B. Wu and D. Chan, J. Microlithogr., Microfabr., Microsyst. 2, 54 (2003).
3. B. Wu and D. Chan, J. Microlithogr., Microfabr., Microsyst. 2, 200 (2003).
4. H. Nakata, K. Nishioka, and H. Abe, J. Vac. Sci. Technol. 17, 1351 (1980).
5. C. Constantine, R. Westerman, and J. Plumhoff, Proc. SPIE 3873, 93 (1999).
6. C. J. Mogab, J. Electrochem. Soc. 124, 1262 (1977).
7. D. L. Flamm, D. N. K. Wang, and D. Maydan, J. Electrochem. Soc. 129, 2755 (1982).
8. M. J. Buie, B. Stoehr, A. Buxbaum, and G. Ruhl, Proc. SPIE 4562, 616 (2001).
9. B. Wu and D. Chan, Proc. SPIE 5038, 1053 (2003).