Cr and MoSi photomask plasma etches

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 1053-1064

  Wu, Banqiu ^a   Chan, David ^a  

^a PHOTRONICS INC   (United States)

Author keywords

Cr; EAPSM; Etch; MoSi; Photomask; Plasma; PSM

Indexed keywords

CALCULATIONS; CHROMIUM; INTEGRATED CIRCUIT MANUFACTURE; MASKS; MATHEMATICAL MODELS; MOLYBDENUM COMPOUNDS; OPTIMIZATION; PHOTORESISTS; REACTION KINETICS;

CHEMICALLY AMPLIFIED RESIST; CRITICAL DIMENSION UNIFORMITY; ETCH KINETICS; PHASE SHIFT MASK; PHOTOMASK; RETICLE ENHANCEMENT TECHNOLOGY;

PLASMA ETCHING;

EID: 0141723533     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483666     Document Type: Conference Paper

References (6)

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