Measurements of the geometrical characteristics of the silicon wafer for helium microscope focusing mirror

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5948 I, Issue , 2005, Pages 1-8

  Litwin, D ^a   Galas, J ^a   Kozlowski T ^a   Sitarek, S ^a  

^a INSTITUTE OF APPLIED OPTICS   (Poland)

Author keywords

Confocal sensors; Flatness measurements; Helium atom microscopy; Shape; Thickness

Indexed keywords

ATOMIC FORCE MICROSCOPY; HELIUM; HIGH PRESSURE EFFECTS; MEASUREMENT THEORY; SURFACE PROPERTIES; THICKNESS CONTROL;

CONFOCAL SENSORS; FLATNESS MEASUREMENTS; HELIUM ATOM MICROSCOPY; SHAPE;

SILICON WAFERS;

EID: 32144464745     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.622456     Document Type: Conference Paper

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