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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5560-5564

Laser shock removal of nanoparticles from si capping layer of extreme ultraviolet lithography masks

(9) Lee, Sang Ho a Kang, Young Jae a Park, Jin Goo a Busnaina, Ahmed A b Lee, Jong Myung c Kim, Tae Hoon c Zhang, Guojing d Eschbach, Florence d Ramamoorthy, Arun d

a Hanyang University (South Korea)

b NORTHEASTERN UNIVERSITY (United States)

c Laser Engineering Group (South Korea)

d INTEL CORPORATION (United States)

Author keywords

EUV mask; EUV surface damage; Laser shock wave cleaning; Particle removal; Si capping layer; UV laser cleaning

Indexed keywords

IRRADIATION; LASER APPLICATIONS; LATEXES; POLYSTYRENES; SHOCK WAVES; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); LASER SHOCK WAVES;

LITHOGRAPHY;

EID: 31944446095 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.44.5560 Document Type: Article

Times cited : (22)

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