Fabrication of low line edge roughness mold by spin on glass (SOG) replica method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5617-5621

  Kurashima, Yuichi ^a,b   Hiroshima, Hiroshi ^a   Komuro, Masanori ^c   Yamazaki, Naoto ^b   Taniguchi, Jun ^b   Miyamoto, Iwao ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

^c Oita Industrial Research Institute   (Japan)

Author keywords

Anisotropic wet etching; CD AFM; KOH; Line edge roughness; Lithography; Photo nanoimprint; Photocurable polymer; Si(110); SOG replica method; Spin on glass

Indexed keywords

ANISOTROPY; ETCHING; FABRICATION; POLYMERS; SPIN GLASS;

ANISOTROPY WET ETCHING; CD-AFM; KOH; PHOTOCURABLE POLYMERS; SOG REPLICA METHOD;

GLASS;

EID: 31844441081     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5617     Document Type: Article

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