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Journal of Photopolymer Science and Technology
Volumn 13, Issue 5, 2000, Pages 733-738
Studies on reaction mechanisms of EB resist by pulse radiolysis
(4)
Tsuji, Shou
a
Kozawa, Takahiro
a
Yamamoto, Yukio
a
Tagawa, Seiichi
a
a
OSAKA UNIVERSITY
(
Japan
)
Author keywords
Acid generator; Chemically amplified resist; Electron; Electron beam; Pulse radiolysis; Rate constant; Reaction mechanism
Indexed keywords
ACID;
ARTICLE; CATALYSIS; CHEMICAL REACTION; ELECTRON BEAM; GENERATOR; RADIATION EXPOSURE; RADIOLYSIS; SHELF LIFE; SOLVATION;
EID
:
0034583953
PISSN
:
09149244
EISSN
:
None
Source Type
:
Journal
DOI
:
10.2494/photopolymer.13.733
Document Type
:
Article
Times cited : (
26
)
References (
20
)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
