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Volumn PV 2005-05, Issue , 2005, Pages 404-410

Characteristics of Hf(Si,O) gate dielectrics as a function of HF content

Author keywords

[No Author keywords available]

Indexed keywords

LIQUID PRECURSORS; MIST DEPOSITION;

DIELECTRIC MATERIALS; STOICHIOMETRY; THIN FILMS;

HAFNIUM COMPOUNDS;

EID: 31844445688 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (2)

References (15)

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