SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 4045-4049

Fabrication of low line edge roughness mold for photo-nanoimprint

(9) Kurashima, Yuichi a,b Hiroshima, Hiroshi a Komuro, Masanori a Kim, Sang Hoon a Yamazaki, Naoto b Taniguchi, Jun b Miyamoto, Iwao b Namatsu, Hideo c Matsui, Shinji d

a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

b TOKYO UNIVERSITY OF SCIENCE (Japan)

c NTT CORPORATION (Japan)

d UNIVERSITY OF HYOGO (Japan)

Author keywords

Anisotropic wet etch; CD AFM; KOH; Line edge roughness; Lithography; Photo nanoimprint; Photocurable polymer; Si(110); Spin on glass

Indexed keywords

ANISOTROPIC WET ETCH; CRITICAL DIMENSIONS (CD)-ATOMIC-FORCE MICROSCOPY (AFM); KOH; LINE EDGE ROUGHNESS; PHOTO-NANOIMPRINT; PHOTOCURABLE POLYMER; SPIN ON GLASS;

ELECTRON BEAMS; GLASS; PHOTOPOLYMERIZATION; PROBLEM SOLVING; SAMPLING; SCANNING ELECTRON MICROSCOPY;

ATOMIC FORCE MICROSCOPY;

EID: 4444232868 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/JJAP.43.4045 Document Type: Conference Paper

Times cited : (13)

References (10)

1
- 0029327416
- M. Nagase, H. Namatsu, K. Kurihara, K. Iwadate and K. Murase: Jpn. J. Appl. Phys. 34 (1995) 3382.
- (1995) Jpn. J. Appl. Phys. , vol.34 , pp. 3382
- Nagase, M.¹ Namatsu, H.² Kurihara, K.³ Iwadate, K.⁴ Murase, K.⁵

2
- 0042363403
- T. Yamaguchi, K. Yamazaki, M. Nagase and H. Namatsu: Jpn. J. Appl. Phys. 42 (2003) 3755.
- (2003) Jpn. J. Appl. Phys. , vol.42 , pp. 3755
- Yamaguchi, T.¹ Yamazaki, K.² Nagase, M.³ Namatsu, H.⁴

3
- 0041361764
- A. Yamaguchi and O. Komuro: Jpn. J. Appl. Phys. 42 (2003) 3763.
- (2003) Jpn. J. Appl. Phys. , vol.42 , pp. 3763
- Yamaguchi, A.¹ Komuro, O.²

4
- 0038117768
- G. P. Patsis, V. Constantoudis, A. Tserepi and E. Gogolides: J. Vac. Sci. & Technol. B 21 (2003) 1008.
- (2003) J. Vac. Sci. & Technol. B , vol.21 , pp. 1008
- Patsis, G.P.¹ Constantoudis, V.² Tserepi, A.³ Gogolides, E.⁴

5
- 0038457081
- V. Constantoudis, G. P. Patsis, A. Tserepi and E. Gogolides: J. Vac. Sci. & Technol. B 21 (2003) 1019.
- (2003) J. Vac. Sci. & Technol. B , vol.21 , pp. 1019
- Constantoudis, V.¹ Patsis, G.P.² Tserepi, A.³ Gogolides, E.⁴

6
- 0042363332
- Y. Kurashima, M. Komuro, H. Hiroshima, J. Taniguchi and I. Miyamoto: Jpn. J. Appl. Phys. 42 (2003) 3871.
- (2003) Jpn. J. Appl. Phys. , vol.42 , pp. 3871
- Kurashima, Y.¹ Komuro, M.² Hiroshima, H.³ Taniguchi, J.⁴ Miyamoto, I.⁵

7
- 0029344465
- H. Namatsu, M. Nagase, K. Kurihara, K. Iwadate, T. Furuta and K. Murase: J. Vac. Sci. & Technol. B 13 (1995) 1473.
- (1995) J. Vac. Sci. & Technol. B , vol.13 , pp. 1473
- Namatsu, H.¹ Nagase, M.² Kurihara, K.³ Iwadate, K.⁴ Furuta, T.⁵ Murase, K.⁶

8
- 0035519475
- S. Matsui, Y. Igaku and H. Ishigaki: J. Vac. Sci. & Technol. B 19 (2001) 2801.
- (2001) J. Vac. Sci. & Technol. B , vol.19 , pp. 2801
- Matsui, S.¹ Igaku, Y.² Ishigaki, H.³

9
- 69649108610
- submitted to
- J. Taniguchi, M. Iida, S. Takezawa, Y. Kurashima, I. Miyamoto, M. Komuro, H. Hiroshima, S. Matsui, N. Sakai and K. Tada: submitted to Jpn. J. Appl. Phys.
- Jpn. J. Appl. Phys.
- Taniguchi, J.¹ Iida, M.² Takezawa, S.³ Kurashima, Y.⁴ Miyamoto, I.⁵ Komuro, M.⁶ Hiroshima, H.⁷ Matsui, S.⁸ Sakai, N.⁹ Tada, K.¹⁰

10
- 4444239695
- to be published in
- H. Hiroshima, M. Komuro, Y. Kurashima, S. Kim and T. Muneishi: to be published in Jpn. J. Appl. Phys. 43 (2004).
- (2004) Jpn. J. Appl. Phys. , vol.43
- Hiroshima, H.¹ Komuro, M.² Kurashima, Y.³ Kim, S.⁴ Muneishi, T.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.