SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 200, Issue 10 SPEC. ISS., 2006, Pages 3314-3318

The study of diffusion and nucleation for CoSi2 formation by oxide-mediated cobalt silicidation

(4) Chang, Juin Jie a Liu, Chuan Pu b Hsieh, Tsung Eong a Wang, Ying Lang c

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

c NATIONAL UNIVERSITY OF TAINAN (Taiwan)

Author keywords

Cobalt silicide; Diffusion; Nucleation; Oxide mediated silicidation

Indexed keywords

ANNEALING; DIFFUSION; INTERFACES (MATERIALS); ION IMPLANTATION; NUCLEATION; SILICA; SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

COBALT SILICIDATION; COBALT SILICIDE; DIFFUSION RATE; NUCLEATION RATE; OXIDE-MEDIATED SILICIDATION;

COBALT COMPOUNDS;

ANNEALING; COBALT COMPOUNDS; DIFFUSION; INTERFACES (MATERIALS); ION IMPLANTATION; NUCLEATION; SILICA; SILICON; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 31644450219 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/j.surfcoat.2005.07.044 Document Type: Article

Times cited : (13)

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