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Volumn 44, Issue 12, 2005, Pages 8286-8287
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Diffusion coefficient of as and P in HfO2
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Author keywords
Arsenic; Diffusion; Gate; HfO2; Phosphorous
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Indexed keywords
DIFFUSION;
HAFNIUM COMPOUNDS;
IMPURITIES;
ION IMPLANTATION;
PHOSPHORUS;
SILICA;
GATE INSULATORS;
GATES;
HFO2;
IMPURITY PENETRATION;
ARSENIC;
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EID: 31544464081
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.44.8286 Document Type: Article |
Times cited : (4)
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References (12)
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