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Journal of Applied Physics

Volumn 96, Issue 1, 2004, Pages 327-334

Gallium adsorption onto (112̄0) gallium nitride surfaces

(4) McLaurin, M a Haskell, B a Nakamura, S a Speck, J S a

a University of California (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDRIDE VAPOR-PHASE EPITAXY (HVPE); OPTICAL PYROMETERS; PLASMA-ASSISTED MOLECULAR BEAM EPITAXY (PAMBE); THERMAL EQUILIBRIUM;

ADSORPTION; CRYSTAL ORIENTATION; FLUXES; GALLIUM NITRIDE; MATHEMATICAL MODELS; MOLECULAR BEAM EPITAXY; PLASMA SOURCES; PYROMETERS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICON WAFERS; STOICHIOMETRY; SUBSTRATES; SUPERLATTICES; SURFACE PHENOMENA; THERMAL EFFECTS; X RAY ANALYSIS;

GALLIUM;

EID: 3142753509 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1759086 Document Type: Article

Times cited : (18)

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