Investigations of transient phase formation in Ti/Si thin film reaction

Journal of Applied Physics

Volumn 96, Issue 1, 2004, Pages 361-368

  Chaix Pluchery, O ^a   Chenevier, B ^a   Matko, I ^a   Senateur J P ^a   La Via, F ^b  

^a GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^b CNR IMM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFUSION; GRAIN BOUNDARIES; INTERFACES (MATERIALS); ISOTHERMS; MICROSTRUCTURE; PHASE TRANSITIONS; REACTION KINETICS; SILICON; SPUTTER DEPOSITION; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VOLUME FRACTION; X RAY DIFFRACTION ANALYSIS;

ION SCATTERING; METASTABLE PHASES; PHASE FORMATION; SOLID PHASE REACTIONS;

TITANIUM;

EID: 3142686081     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1759395     Document Type: Article

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