Stresses arising from a solid state reaction between palladium films and Si(001) investigated by in situ combined x-ray diffraction and curvature measurements

Journal of Applied Physics

Volumn 94, Issue 3, 2003, Pages 1584-1591

  Gergaud, P ^a   Thomas, O ^a,b   Chenevier, B ^a  

^a CNRS   (France)

^b Department of Obstetrics Gynecology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; CRYSTAL ORIENTATION; ELASTIC MODULI; FILM GROWTH; PALLADIUM; SILICON COMPOUNDS; STRAIN; STRESS ANALYSIS; TEXTURES; THERMAL EXPANSION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

SOLID STATE REACTIONS;

METALLIC FILMS;

EID: 0042011373     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1590059     Document Type: Article

References (42)

1. M.-A. Nicolet and S. S. Lau, in VLSI Electronics: Microstructure Science, edited by N. G. Einspruch and G. B. Larrabee (Academic, New York, 1983), p. 330.
2. A. Steegen and K. Maex, Mater. Sci. Eng. 38, 1 (2002).
3. J. Angilello, J. E. Baglin, F. M. d'Heurle, C. S. Petersson, and A. Segmüller, in Thin Film Interfaces and Interactions, edited by J. E. Baglin and J. Poate (The Electrochemical Society, Pennington, N.J., 1980), p. 369.
4. K. N. Tu and J. Mayer, in Thin Films: Interactions and Diffusion, edited by J. Poate, K. N. Tu, and J. Mayer (Wiley, New York, 1978), p. 359.
5. F. M. d'Heurle and O. Thomas, Defect Diffus. Forum 129-130, 137 (1996).
6. P. Gergaud, O. Thomas, B. Chenevier, V. Ghetta, A. Mouroux, and S. L. Zhang, in Proceedings of the 16th Course of the International School of Solid State Physics: Silicides: Fundamentals and Applications, edited by L. Miglio and F. M. d'Heurle (Erice, Italy, 2000), p 303.
7. J. T. Pan and I. Blech, J. Appl. Phys. 55, 2874 (1984).
8. P. P. Buaud, F. M. d'Heurle, S. Chevacharoenkul, and E. A. Irene, J. Vac. Sci. Technol. B 11, 304 (1993).
9. S. Yanagisawa and T. Fukuyama, J. Electrochem. Soc. 127, 1150 (1980).
10. P. P. Buaud, F. M. d'Heurle, E. A. Irene, B. K. Patnaik, and N. R. Parikh, J. Vac. Sci. Technol. B 9, 2356 (1991).
11. A. R. Sitaram, J. C. Kalb, and S. P. Murarka, Mater. Res. Soc. Symp. Proc. 188, 67 (1990).
12. V. Svilan, J. M. E. Harper, C. Cabrai, and L. Clevenger, Mater. Res. Soc. Symp. Proc. 356, 167 (1995).
13. C. J. Tsai and K. H. Yu, Thin Solid Films 350, 91 (1999).
14. G. E. White and H. Chen, J. Appl. Phys. 68, 3317 (1990).
15. G. Lucadamo, C. Lavoie, C. Cabral, Jr., R. A. Carruthers, and J. M. E. Harper, Mater. Res. Soc. Symp. Proc. 611, C6.3 (2000).
16. P. Gergaud, O. Thomas, B. Chenevier, V. Ghetta, A. Mouroux, and S.-L. Zhang, Mater. Res. Soc. Symp. Proc. 615, G8.3 (2000).
17. S. L. Zhang and F. M. d'Heurle, Thin Solid Films 213, 34 (1992).
18. J. Angilello, F. d'Heurle, S. Peterson, and A. Segmüller, J. Vac. Sci. Technol. 17, 471 (1980).
19. K. N. Tu, J. Appl. Phys. 53, 428 (1982).
20. U. K. Kühler, J. E. Demuth, and R. J. Hamers, Phys. Rev. Lett. 60, 2499 (1988).
21. G. E. White and H. Chen, J. Appl. Phys. 67, 3689 (1990).
22. J. F. Chen and L. J. Chen, Mater. Chem. Phys. 39, 229 (1995).
23. W. K. Chu, S. S. Lau, J. W. Mayer, H. Müller, and K. N. Tu, Thin Solid Films 25, 393 (1975).
24. M. Wittmer and K. N. Tu, Phys. Rev. B 27, 1173 (1983).
25. N. W. Cheung, M.-A Nicolet, M. Wittmer, C. A. Evans, Jr., and T. T. Sheng, Thin Solid Films 79, 51 (1981).
26. T. W. Little and H. Chen, J. Appl. Phys. 63, 1182 (1988).
27. R. Massara and P. Feschotte, J. Alloys Compd. 190, 249 (1993).
28. W. D. Buckley and S. C. Moss, Solid-State Electron. 15, 1331 (1972).
29. I. Noyan and J. Cohen, Residual Stress (Springer, Stuttgart, 1987).
30. P. Gergaud, S. Labat, and O. Thomas, Thin Solid Films 319, 9 (1998).
31. M. Zaouali, J. L. Lebrun, and P. Gergaud, Surf. Coat. Technol. 50, 5 (1991).
32. B. M. Clemens and J. A. Bain, MRS Bull. 17, 46 (1992).
33. B. Coulman and H. Chen, J. Appl. Phys. 59, 3467 (1986).
34. P. A. Flinn, D. S. Gardner, and W. D. Nix, IEEE Trans. Electron Devices ED-34, 689 (1987).
35. G. G. Stoney, Proc. R. Soc. London, Ser. A 82, 172 (1909).
36. W. A. Brantley, J. Appl. Phys. 44, 534 (1973).
37. K. Anderko and K. Schubert, Z. Metallkd. 44, 307 (1953).
38. R. W. Bower, D. Sigurd, and R. E. Scott, Solid-State Electron. 16, 1461 (1973).
39. L. Maissel, J. Appl. Phys. 31, 211 (1960).
40. D. R. Lide, Chemical Rubber Company Handbook of Chemistry and Physics, 79th ed. (Chemical Rubber Corp., Boca Raton, FL, 1998).
41. Matko (private communication).
42. P. Gergaud, M. Megdiche, O. Thomas, and B. Chenevier (unpublished).