Growth of nanocrystalline silicon films by helicon wave plasma chemical vapour deposition

Chinese Physics Letters

Volumn 21, Issue 7, 2004, Pages 1320-1322

  Yu, Wei ^a   Wang, Bao Zhu ^a   Lu, Wan Bing ^a   Yang, Yan Bin ^a   Han, Li ^a   Fu, Guang Sheng ^a  

^a HEBEI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; HELICONS; NANOCRYSTALLINE SILICON; NANOCRYSTALS; PLASMA CVD; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

ATOMIC-FORCE-MICROSCOPY; CRYSTALLINE FRACTIONS; DEPOSITED FILMS; LARGEST GRAIN SIZES; NANO-CRYSTALLINE SILICON THIN FILMS; NANOCRYSTALLINE SILICON FILMS; SI SUBSTRATES; SUBSTRATES TEMPERATURE; VAPOR-DEPOSITION TECHNIQUES;

ATOMIC FORCE MICROSCOPY;

EID: 3142676519     PISSN: 0256307X     EISSN: None     Source Type: Journal    
DOI: 10.1088/0256-307X/21/7/038     Document Type: Article

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