Reactive magnetron sputtering of molybdenum sulfide thin films: In situ synchrotron x-ray diffraction and transmission electron microscopy study

Journal of Applied Physics

Volumn 95, Issue 12, 2004, Pages 7665-7673

  Weiss, V ^a   Bohne, W ^a   Rohrich J ^a   Strub, E ^a   Bloeck, U ^a   Sieber, I ^a   Ellmer, K ^a   Mientus, R ^b   Porsch, F ^c  

^a HAHN MEITNER INSTITUT   (Germany)

^b Opto Transmitter U   (Germany)

^c UNIVERSITY OF BONN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; CRYSTAL DEFECTS; CRYSTAL LATTICES; FILM GROWTH; FLUORESCENCE; FOURIER TRANSFORMS; GRAPHITE; NUCLEATION; SCANNING ELECTRON MICROSCOPY; STRAIN; STRESSES; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DIFFRACTION ANGLES; ENERGY DISPERSIVE X-RAY DIFFRACTION (EDXD); MICROSTRAIN; REACTIVE MAGNETRON SPUTTERING;

MAGNETRON SPUTTERING;

EID: 3142660491     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1736323     Document Type: Article

References (56)

1. V. Buck, Wear 114, 263 (1987).
2. T. Spalvins, J. Vac. Sci. Technol. A 5, 212 (1987).
3. P. D. Fleischauer, Thin Solid Films 154, 309 (1987).
4. H. Wise, Polyhedron 5, 145 (1986).
5. H. Tributsch, Ber. Bunsenges. Phys. Chem. 81, 361 (1977).
6. E. A. Ponomarev, R. Tenne, A. Katty, and C. Lèvy-Clement, Sol. Energy Mater, Sol. Cells 52, 125 (1998).
7. J. R. Lince and D. J. Carre, Phys. Rev. B 36, 1647 (1987).
8. J. Pütz and M. A. Aegerter, Thin Solid Films 351, 119 (1999).
9. J. C. Bernède, J. Pouzet, E. Gourmelon, and H. Hadouda, Synth. Met. 99, 45 (1999).
10. H. Hadouda, J. C. Bernède, J. Pouzet, and R. Le Ny, Mater. Sci. Eng., B 45, 9 (1997).
11. P. A. Bertrand, J. Mater. Res. 4, 180 (1989).
12. J. H. Moser, F. Lévy, and F. Bussy, J. Vac. Sci. Technol. A12, 494 (1994).
13. R. Bichsel and F. Lévy, J. Phys. D 19, 1809 (1986).
14. R. Bichsel, P. Buffat, and F. Lévy, J. Phys. D 19, 1575 (1986).
15. G. Chatzitheodorou, S. Fiechter, M. Kunst, J. Luck, and H. Tributsch, MRS Bull. 23, 1261 (1988).
16. W. K. Hofmann, J. Mater. Sci. 23, 3981 (1988).
17. B. Buras and L. Gerward, Prog. Cryst. Growth Charact. 18, 93 (1989).
18. S. Qih, X. Wu, J. Liu, Z.-Y. Wu, X.-D. Li, and A.-H. Lu, Chin. Phys. Lett. 20, 1172 (2003).
19. E. F. Skelton, S. B. Qadri, A. W. Webb, C. W. Lee, and J. P. Krikland, Rev. Sci. Instrum. 54, 403 (1983).
20. G. Heimel, P. Puschnig, M. Oehzelt, K. Hummer, B. Koppelhuber-Bitschnau, F. Porsch, C. Ambrosch-Draxl, and R. Resel, J. Phys.: Condens. Matter 15, 3375 (2003).
21. L. Engelke, M. Schaefer, M. Schur, and W. Bensch, Chem. Mater. 13, 1383 (2001).
22. R. J. Francis, S. J. Price, S. O'Brien, A. M. Fogg, D. O'Hare, T. Loiseau, and G. Férey, Chem. Commun. 1997, 521.
23. J. S. O. Evans, R. J. Francis, D. O'Hare, S. J. Price, S. M. Clark, J. Flaherty, J. Gordon, A. Nield, and C. C. Tang, Rev. Sci. Instrum. 66, 2442 (1995).
24. S. L. Colston, S. D. M. Jacque, P. Barnes, A. C. Jupe, and C. Hall, J. Synchrotron Radiat. 5, 112 (1998).
25. F. Ronci, B. Scrosati, V. R. Albertini, and P. Perfetti, J. Phys. Chem. B 105, 754 (2001).
26. K. Ellmer, R. Mientus, V. Weiss, and H. Rossner, Meas. Sci. Technol. 14, 336 (2003).
27. E. Rudigier et al., Thin Solid Films 431-432, 110 (2003).
28. V. Weiss, R. Mientus, and K. Ellmer, Mater. Res. Soc. Symp. Proc. 721, 131 (2002).
29. K. Ellmer, R. Mientus, V. Weiss, and H. Rossner, Nucl. Instrum. Methods Phys. Res. A 467-468, 1041 (2001).
30. L. R. Doolittle, Nucl. Instrum. Methods Phys. Res. B 9, 344 (1985).
31. W. Bohne, J. Röhrich, and G. Röschert, Nucl. Instrum. Methods Phys. Res. B 136-138, 633 (1998).
32. G. M. Zorn, RBFSIM 1.1, Analytical Application Note, Siemens (1994).
33. JCPDS File No. 37-1492, International Centre for Diffraction Data, Swarthmore, PA.
34. P. B. Mirkarimi, K. F. McCarty, and D. L. Medlin, Mater. Sci. Eng., R. 21, 47 (1997).
35. N. Schell, W. Matz, J. Bøttiger, J. Chevallier, and P. Kringhoj, J. Appl. Phys. 91, 2037 (2002).
36. J. H. Moser and F. Lévy, J. Mater. Res. 7, 734 (1992).
37. J. H. Moser, H. Liao, and F. Lévy, J. Phys. D 23, 624 (1990).
38. M. Genut, L. Margulis, G. Hodes, and R. Tenne, Thin Solid Films 217, 91 (1992).
39. W. K. Hsu, Y. Q. Zhu, S. Firth, M. Terrones, H. Terrones, S. Trasobares, R. J. H. Clark, H. W. Kroto, and D. R. M. Walton, Carbon 39, 1107 (2001).
40. R. L. D. Whitby, W. K. Hsu, T. H. Lee, C. B. Boothroyd, H. W. Kroto, and D. R. M. Walton, Chem. Phys. Lett. 359, 68 (2002).
41. M. José-Yacamán, G. Diaz, and A. Gomez, Catal. Today 23, 161 (1995).
42. T. Issihiki, K. Nishio, H. Saijo, M. Shiojiri, Y. Yabuuchi, and N. Takahashi, Microsc. Res. Tech. 25, 325 (1993).
43. M. Shiojiri, T. Issihiki, H. Saijo, Y. Yabuuchi, and N. Takahashi, J. Electron Microsc. 42, 72 (1993).
44. T. Issihiki, K. Nishio, I. Aoyagi, Y. Yabuuchi, N. Takahashi, H. Saijo, and M. Shiojiri, Wear 170, 55 (1993).
45. A. Oberlin, in Chemistry and Physics of Carbon, edited by P. A. Thrower (Dekker, New York, 1989), Vol. 22, p. 1.
46. D. Yang and R. F. Frindt, J. Mater. Res. 11, 1733 (1996).
47. M. Hüppauff, K. Bange, and B. Lengeler, Thin Solid Films 230, 191 (1993).
48. A. Aubert, J. P. Nabot, J. Ernoult, and P. Renaux, Surf. Coat. Technol. 41, 127 (1990).
49. H. Dimigen, H. Hübsch, P. Willich, and K. Reichelt, Thin Solid Films 129, 79 (1985).
50. K. Ellmer, J. Phys. D 33, R17 (2000).
51. L. Brewer and R. H. Lamoreaux, in Binary Alloy Phase Diagrams, edited by T. B. Massalski (ASM International, Materials Park, OH, 1990), Vol. 3, p. 2660.
52. K. Reichelt and G. Mair, J. Appl. Phys. 49, 1245 (1978).
53. S. Vasudevan, J. M. Thomas, C. J. Wright, and C. Sampson, J. Chem. Soc., Chem. Commun. 1982, 418
54. J. Chen, S. L. Li, and Z. L. Tao, J. Alloys Compd. 356-357, 413 (2003).
55. J. Chen, N. Kuriyama, H. T. Takeshita, and T. Sakai, J. Am. Chem. Soc. 123, 11813 (2001).
56. M. Regula, C. Ballif, J. H. Moser, and F. Lévy, Thin Solid Films 280, 67 (1996).