Wafer surface reconstruction from top-down scanning electron microscope images

Microelectronic Engineering

Volumn 75, Issue 2, 2004, Pages 216-233

  Gelenbe, Erol ^a   Koçak, Taşkin ^a   Wang, Rong ^a  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

Artificial neural networks; Critical dimension metrology; Image processing; Scanning electron microscopy; Semiconductor fabrication

Indexed keywords

DIFFERENTIAL EQUATIONS; ELECTRON BEAMS; IMAGE RECONSTRUCTION; INVERSE PROBLEMS; MATHEMATICAL MODELS; NEURAL NETWORKS; PHOTORESISTORS; SCANNING ELECTRON MICROSCOPY; WAVEFORM ANALYSIS;

CRITICAL DIMENSION METROLOGY; SEMICONDUCTOR FABRICATION; WAFER SURFACE PATTERNS;

MICROELECTRONICS;

EID: 3142656045     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.05.006     Document Type: Article

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