Contact hole characterization by SEM waveform analysis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 309-314

  Sutherland, D G J ^a   Veldman, Andrei ^a   Osborne, Zoe A ^a  

^a CYPRESS SEMICONDUCTOR   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; NONDESTRUCTIVE EXAMINATION; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; WAVEFORM ANALYSIS;

CONTACT HOLES; CRITICAL DIMENSION-SCANNING ELECTRON MICROSCOPES (CD-SEM);

PHOTORESISTS;

EID: 0032663954     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350819     Document Type: Conference Paper

References (6)