Deep, vertical etching of flame hydrolysis deposited hi-silica glass films for optoelectronic and bioelectronic applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 1860-1863

  McLaughlin, A J ^a   Bonar, J R ^a   Jubber, M G ^a   Marques, P V S ^a,b   Hicks, S E ^a   Wilkinson, C D W ^a   Aitchison, J S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b UNIVERSITY OF PORTO   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037924105     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590098     Document Type: Article

References (10)

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