Copper nucleation by chemical vapour deposition on organosilane treated SiO2 surfaces

Surface Science

Volumn 562, Issue 1-3, 2004, Pages 157-169

  Semaltianos, N G ^a,b   Pastol, J L ^a   Doppelt, P ^a  

^a CNRS   (France)

^b QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

Author keywords

Atomic force microscopy; Chemical vapor deposition; Clusters; Copper; Nucleation; Scanning electron microscopy (SEM); Silane; Silicon oxides

Indexed keywords

ACTIVATION ENERGY; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COPPER; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SILANES; SURFACE CHEMISTRY;

CLUSTER FORMATION; COPPER NUCLEATION; ORGANOSILANES; SUBSTRATE TEMPERATURES;

SILICA;

EID: 3142533146     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.05.136     Document Type: Article

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