Copper chemical vapour deposition on organosilane-treated SiO 2 surfaces

Applied Surface Science

Volumn 222, Issue 1-4, 2004, Pages 102-109

  Semaltianos, N G ^a   Pastol, J L ^a   Doppelt, P ^a  

^a CNRS   (France)

Author keywords

Chemical vapour deposition; Organosilane; Self assembled monolayers

Indexed keywords

ACETONE; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DIFFUSION; FILM GROWTH; INDUSTRIAL APPLICATIONS; MICROELECTRONICS; MORPHOLOGY; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILANES; SURFACE TREATMENT; THIN FILMS;

PRECURSORS; ULTRAVIOLET IRRADIATION;

SILICA;

EID: 0347383781     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.08.003     Document Type: Article

References (24)

1. Li J., Seidel T.E., Mayer J.W. MRS Bull. 19(8):1994;15.
2. Gates S.M. Chem. Rev. 96:1996;1519.
3. Doppelt P. Coord. Chem. Rev. 180:1998;1783.
4. Doppelt P., Stelzle M. Microelctr. Eng. 33:1997;15.
5. Krishnamoorthy A., Chanda K., Murarka S.P., Ramanath G., Ryan J.G. Appl. Phys. Lett. 78:2001;2467.
6. Kaloyeros A.E., Eizenbraun E. Annu. Rev. Mater. Sci. 30:2000;363.
7. P. Doppelt, French Patent 97 03 029, US Patent 6,130,345.
8. T.-Y. Chen, Ph.D. thesis, Universite de Paris 6, 2000.
9. Chen T.-Y., Vaissermann J., Ruiz E., Sénateur J.P., Doppelt P. Chem. Mater. 13:2001;3993.
10. Krishnamoorthy A., Chanda K., Murarka S.P., Ramanath G., Ryan J.G. Appl. Phys. Lett. 78:2001;2467.
11. Ramanath G., Gui G., Ganesan P.G., Guo X., Ellis A.V., Stukowski M., Vijayamohanan K., Doppelt P., Lane M. Appl. Phys. Lett. 83:2003;383.
12. Schwartz P., Schreiber F., Eisenberger P., Scoles G. Surf. Sci. 423:1999;208.
13. Nguyen T., Charneski L.J., Hsu S.T. J. Electrochem. Soc. 144:1997;2829.
14. Venables J.A., Spiller G.D.T., Hanbücken M. Rep. Prog. Phys. 47:1984;399.
15. Ekerdt J.G., Sun Y.-M., Szabo A., Szulczewski G.J., White J.M. Chem. Rev. 96:1996;1499.
16. Doppelt P., Buthod D., Stelzle M. Lett. Sci. Chim. 58:1996;22.
17. J.H. Seinfeld, Atmospheric Chemistry and Physics of Air Pollution, Wiley, New York, 1986.
18. Demore W.B., Raper O.F. J. Chem. Phys. 44:1966;1780.
19. Snelling D.R., Baiamonte V.D., Bair E.J. J. Chem. Phys. 44:1966;4137.
20. Zhang Y., Terrill R.H., Tanzer T.A., Bohn P.W. J. Am. Chem. Soc. 120:1998;2654.
21. Huang J., Hemminger J.C. J. Am. Chem. Soc. 115:1993;3342.
22. Norrod K.L., Rowlen K.L. J. Am. Chem. Soc. 120:1998;2656.
23. Tarlow M.J., Burgess D.R.F. Jr., Gillen G. J. Am. Chem. Soc. 115:1993;5305.
24. E.S. Beck, E.J. Karwacki Jr., R.J. Ciotti, T.A.J. Norman, European Patent 1180553, US Patent 2000-638586.