Effect of mask thickness on the nanoscale sidewall roughness and optical scattering losses of deep-etched InPInGaAsP high mesa waveguides

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 5, 2005, Pages 2041-2045

  Zhao, W ^a   Bae, J W ^a   Adesida, I ^a   Jang, J H ^b  

^a University of Illinois at Urbana Champaign   (United States)

^b Gwangju Institute of Science and Technology (GIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL SCATTERING LOSS; WAVEGUIDE SIDEWALLS;

ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; MASKS; SEMICONDUCTING INDIUM COMPOUNDS; WAVEGUIDES;

HETEROJUNCTIONS;

EID: 31144441051     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2050659     Document Type: Article

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