Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope

Applied Physics Letters

Volumn 83, Issue 20, 2003, Pages 4116-4118

  Jang, J H ^a   Zhao, W ^a   Bae, J W ^a   Selvanathan, D ^a   Rommel, S L ^a   Adesida, I ^a   Lepore, A ^b   Kwakernaak, M ^b   Abeles, J H ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b SARNOFF CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; HETEROJUNCTIONS; INDUCTIVELY COUPLED PLASMA; MORPHOLOGY; PHOTORESISTS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

AUTO-CORRELATION FUNCTION; AUTO-COVARIANCE FUNCTIONS; ELECTRON BEAM RESIST SYSTEM; ELECTRON PROBE ROUGHNESS ANALYZER; LINE EDGE ROUGHNESS;

OPTICAL WAVEGUIDES;

EID: 0347410958     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1627480     Document Type: Article

References (13)

1. V. Van, P. P. Absil, J. V. Hryniewicz, and P.-T. Ho, J. Lightwave Technol. 19, 1734 (2001).
2. D. Rafizadeh, J. P. Zhang, R. C. Tiberio, and S. T. Ho, J. Lightwave Technol. 16, 1308 (1998).
3. S. J. Choi, K. Djordjev, S. J. Choi, and P. D. Dapkus, J. Vac. Sci. Technol. B 20, 301 (2002).
4. P. K. Tien, Appl. Opt. 10, 2395 (1971).
5. D. Marcuse, Bell Syst. Tech. J. 48, 3187 (1969).
6. J. P. R. Lacey and F. P. Payne, IEE Proc. Part J 137, 282 (1990).
7. A. Matsutani, F. Koyama, and K. Iga, Appl. Phys. Lett. 66, 64 (1995).
8. Y. Martin and H. K. Wickramasinghe, Appl. Phys. Lett. 64, 2498 (1994).
9. K. Hosomi, M. Shirai, K. Hiruma, J. Shigeta, and T. Katsuyama, IEICE Trans. Electron. E79-C, 1579 (1996).
10. G. W. Reynolds and J. W. Taylor, J. Vac. Sci. Technol. B 17, 2723 (1999).
11. K. K. Lee, D. R. Lim, H. C. Luan, A. Agarwal, J. Foresi, and L. C. Kimerling, Appl. Phys. Lett. 77, 1617 (2000).
12. S. L. Rommel, J. H. Jang, W. Lu, G. Cueva, L. Zhou, I. Adesida, G. Pajer, R. Whaley, A. Lepore, Z. Schellenbarger, and J. H. Abeles, J. Vac. Sci. Technol. B 20, 1327 (2002).
13. M. H. Kwakernaak, A. N. Lepore, H. Mohseni, H. An, Z. A. Shellenbarger, J. H. Abeles, J.-O. Bae, S. L. Rommel, and I. Adesida, Technical Digest of CLEO, 2003, Baltimore, MD.