Characterization of sidewall roughness of InP/InGaAsP etched using inductively coupled plasma for low loss optical waveguide applications

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2888-2891

  Bae, J W ^a   Zhao, W ^a   Jang, J H ^a   Adesida, I ^a   Lepore, A ^b   Kwakernaak, M ^b   Abeles, J H ^b  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^b SARNOFF CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; EROSION; MASKS; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM PHOSPHIDE; SILICA; STRUCTURE (COMPOSITION); SURFACE ROUGHNESS;

DEEP-ETCHED WAVEGUIDES; MASK EROSION; OPTICAL RADIATIONS;

OPTICAL WAVEGUIDES;

EID: 0942300044     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1625956     Document Type: Conference Paper

References (11)

1. D. Rafizadeh, J. P. Zhang, R. C. Tiberio, and S. T. Ho, J. Lightwave Technol. 16, 1308 (1998).
2. M. K. Chin and S. T. Ho, J. Lightwave Technol. 16, 1433 (1998).
3. M. V. Bazylenko, M. Gross, and M. Faith, Appl. Phys. Lett. 69, 2178 (1996).
4. A. Matsutani, F. Koyama, and K. Iga, Appl. Phys. Lett. 66, 64 (1995).
5. R. Grover, J. V. Hryniewicz, O. S. King, and V. Van, J. Vac. Sci. Technol. B 19, 1694 (2001).
6. R. D. Whaley, B. Gopalan, M. Dagenais, R. D. Gomez, F. G. Johnson, S. Agarwala, O. King, and D. R. Stone, J. Vac. Sci. Technol. B 16, 1007 (1998).
7. M. Ariga, Y. Sekido, A. Sakai, T. Baba, A. Matsutani, F. Koyama, and K. Iga, Jpn. J. Appl. Phys., Part 1 39, 3406 (2001).
8. S. J. Pearton, Mater. Sci. Eng., B 10, 187 (1991).
9. J. R. Lothian, F. Ren, and S. J. Pearton, Semicond. Sci. Technol. 7, 1199 (1992).
10. S. Rommel et al., J. Vac. Sci. Technol. B 20, 1327 (2002).
11. D. Marcuse, Bell Syst. Tech. J. 48, 3187 (1969).