Deposition of vanadium carbide thin films using compound target sputtering and their field emission

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 5, 2005, Pages 1379-1383

  Liao, M Y ^a,b   Gotoh, Y ^a   Tsuji, H ^a   Ishikawa, J ^a  

^a KYOTO UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHROMIUM COMPOUNDS; COMPOSITION; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; CRYSTALLOGRAPHY; DEPOSITION; SPUTTERING; VANADIUM COMPOUNDS;

CRYSTALLOGRAPHIC STRUCTURE; SILICON SUBSTRATES; VANADIUM CARBIDE (VC);

THIN FILMS;

EID: 31144439711     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2008273     Document Type: Article

References (19)

1. W. A. Mackie, T. Xie, and P. R. Davis, J. Vac. Sci. Technol. B 13, 2459 (1995).
2. W. A. Mackie, T. Xie, M. R. Matthews, B. P. Routh, Jr., and P. R. Davis, J. Vac. Sci. Technol. B 16, 2057 (1998).
3. W. A. Mackie, T. Xie, and P. R. Davis, J. Vac. Sci. Technol. B 17, 613 (1999).
4. Y. Gotoh, Y. Kashiwagi, M. Nagao, T. Kondo, H. Tsuji, and J. Ishikawa, J. Vac. Sci. Technol. B 19, 1373 (2001).
5. M. Nagao, Y. Fujimori, Y. Gotoh, H. Tsuji, and J. Ishikawa, J. Vac. Sci. Technol. B 16, 829 (1998).
6. W. A. Mackie, L. A. Southall, T. B. Xie, G. L. Cabe, and P. H. McClelland, J. Vac. Sci. Technol. B 21, 422 (2003).
7. W. K. Lo, G. Parthasarathy, C. W. Lo, D. M. Tanenbaum, H. G. Craighead, and M. S. Isaacson, J. Vac. Sci. Technol. B 14, 3787 (1996).
8. A. A. Rouse, J. B. Bernhard, E. D. Sosa, and D. E. Golden, Appl. Phys. Lett. 76, 2583 (2000).
9. H. W. Hugosson, O. Eriksson, L. Nordstrom, U. Jansson, L. Fast, A. Delin, J. M. Wills, and B. Johansson, J. Appl. Phys. 86, 3758 (1999).
10. Y. Gotoh, M. Y. Liao, H. Tsuji, and J. Ishikawa., Jpn. J. Appl. Phys., Part 2 42, L778 (2003).
11. M. Y. Liao, Y. Gotoh, H. Tsuji, and J. Ishikawa, J. Vac. Sci. Technol. A 22, 214 (2004).
12. M. Y. Liao, Y. Gotoh, H. Tsuji, and J. Ishikawa, J. Vac. Sci. Technol. A 22, 146 (2004).
13. M. Y. Liao, Y. Gotoh, H. Tsuji, and J. Ishikawa, J. Vac. Sci. Technol. B 22, L54 (2004).
14. M. P. Delplancke, V. Vassileris, and R. Winand, J. Vac. Sci. Technol. A 13, 1104 (1995).
15. N. Marechal, E. Quesnel, and Y. Pauleau, J. Mater. Res. 9, 1820 (1994).
16. A. G. Dirks, R. A. M. Wolters, and A. J. M. Nellissen, Thin Solid Films 193194, 201 (1990).
17. V. G. Harris and T. Pokhil, Phys. Rev. Lett. 87, 067207 (2001).
18. C. A. Spindt, I. Brodie, L. Humphrey, and E. R. Westerbeg, J. Appl. Phys. 47, 5248 (1976).
19. G. N. Fursey, Appl. Surf. Sci. 215, 113 (2003).