Emission characteristics of NbC/Nb field emitter array cathodes

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 1 SPEC., 2003, Pages 422-426

  Mackie, W A ^a   Southall, L A ^a   Xie, Tianbao ^a   Cabe, G L ^a   McClelland, P H ^b  

^a Applied Physics Technologies Inc   (United States)

^b HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBIDES; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON BEAMS; ELECTRON EMISSION; HYDROGEN; NIOBIUM; OXYGEN; PHYSICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TEMPERATURE;

DEPOSITION RATE; EMISSION STABILITY; FIELD EMITTER ARRAY CATHODE; NIOBIUM CARBIDE;

FIELD EMISSION CATHODES;

EID: 0037207743     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1527636     Document Type: Article

References (7)

1. W. A. Mackie, J. L. Morrissey, C. H. Hinrichs, and P. R. Davis, J. Vac. Sci. Technol. A 10, 2852 (1992).
2. W. A. Mackie, T. Xie, M. R. Matthews, B. R. Routh, Jr., and P. R. Davis, J. Vac. Sci. Technol. B 16, 2057 (1998).
3. F. M. Charbonnier, W. A. Mackie, R. L. Hartman, and T. Xie, J. Vac. Sci. Technol. B 19, 1064 (2001).
4. W. A. Mackie, T. Xie, J. E. Blackwood, S. C. Williams, and P. R. Davis, J. Vac. Sci. Technol. B 16, 1215 (1998).
5. W. A. Mackie, R. L. Hartman, M. A. Anderson, and P. R. Davis, J. Vac. Sci. Technol. B 12, 722 (1994).
6. W. A. Mackie, T. Xie, and P. R. Davis, J. Vac. Sci. Technol. B 13, 2459 (1995).
7. T. C. Arnoldussen and E. M. Rossi, Annu. Rev. Mater. Sci. 15, 379 (1985).