Nanometer metal line fabrication using a ZEP52050 K PMMA bilayer resist by e-beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 4, 2005, Pages 1603-1606

  An, Lihua ^a   Zheng, Yuankai ^a   Li, Kebin ^a   Luo, Ping ^a   Wu, Yihong ^a,b  

^a DATA STORAGE INSTITUTE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; FABRICATION; OPTIMIZATION; SENSORS;

DISSOLUTION RATES; LIFT-OFF PROCESS; MAGNETIC SENSORS;

POLYMETHYL METHACRYLATES;

EID: 31144439670     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1978893     Document Type: Article

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