Structural studies of materials: Effects of deposition conditions on carbon-film resistivity and microstructure

Powder Metallurgy and Metal Ceramics

Volumn 44, Issue 9-10, 2005, Pages 499-504

  Onoprienko, A A ^a,b   Yanchuk, I B ^a,b  

^a FRANTSEVICH INSTITUTE FOR PROBLEMS OF MATERIALS SCIENCE   (Ukraine)

^b INSTITUTE OF SEMICONDUCTOR PHYSICS   (Ukraine)

Author keywords

Amorphous carbon film; Magnetron sputtering; Raman scattering; Resistivity; Structure

Indexed keywords

CARBON; DEPOSITION; ELECTRON DIFFRACTION; GRAPHITIZATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; RAMAN SCATTERING; THERMAL CONDUCTIVITY;

AMORPHOUS CARBON FILMS; CERAMIC SUBSTRATES; RESISTIVITY; STRUCTURES;

THIN FILMS;

EID: 31144434903     PISSN: 10681302     EISSN: 15739066     Source Type: Journal    
DOI: 10.1007/s11106-006-0015-z     Document Type: Article

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