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Volumn 68, Issue 12, 1996, Pages 1643-1645
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Thermal stability of amorphous carbon films grown by pulsed laser deposition
a b a a b |
Author keywords
[No Author keywords available]
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Indexed keywords
ANNEALING;
CARBON;
EXCIMER LASERS;
GASES;
LASER PULSES;
PULSED LASER APPLICATIONS;
RAMAN SPECTROSCOPY;
SILICON;
THERMAL EFFECTS;
THERMODYNAMIC STABILITY;
TRANSPARENCY;
VACUUM;
AMORPHOUS CARBON;
ION SCATTERING;
LASER FLUENCES;
PULSED LASER DEPOSITION;
AMORPHOUS FILMS;
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EID: 0030110155
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.115891 Document Type: Article |
Times cited : (122)
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References (14)
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