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Volumn 23, Issue 3, 2005, Pages 448-451

Characterization of epitaxial germanium grown on (La xY 1-x) 2O 3 Si(111) using different surfactants

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL QUALITY; GERMANIUM LAYERS;

ANTIMONY; GERMANIUM; MONOLAYERS; SILICON COMPOUNDS; SURFACE ACTIVE AGENTS;

EPITAXIAL GROWTH;

EID: 31044444872 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1875253 Document Type: Article

Times cited : (1)

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