Width-dependent anomalous CoSix sheet resistance change by Ti and TiN capping process

Thin Solid Films

Volumn 498, Issue 1-2, 2006, Pages 282-285

  Chen, Yen Ming ^a   Tu, George C ^a   Wang, Ying Lang ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL UNIVERSITY OF TAINAN   (Taiwan)

Author keywords

Active region; Resistance; Shallow trench isolation; Silicide

Indexed keywords

ELECTRIC RESISTANCE; SILICON; TITANIUM; TITANIUM NITRIDE;

ACTIVE REGION; SHALLOW TRENCH ISOLATION; SILICIDE; ULTRALARGE SILICON INTEGRATED (ULSI);

COBALT COMPOUNDS;

EID: 30944456317     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.127     Document Type: Conference Paper

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