Zone-boundary optimization for direct laser writing of continuous-relief diffractive optical elements

Applied Optics

Volumn 45, Issue 1, 2006, Pages 53-62

  Korolkov, Victor P ^a   Nasyrov, Ruslan K ^a   Shimansky, Ruslan V ^a  

^a INSTITUTE OF AUTOMATION AND ELECTROMETRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CONVOLUTION; DIFFRACTION GRATINGS; FABRICATION;

DIFFRACTION EFFICIENCY; INTENSITY DISTRIBUTION; LASER WRITING; ZONE-BOUNDARY OPTIMIZATION;

DIFFRACTIVE OPTICS;

EID: 30844440986     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.45.000053     Document Type: Article

References (19)

1. V. P. Korolkov, A. I. Malyshev, A. G. Poleshchuk, V. V. Cherkashin, H. J. Tiziani, C. Pruss, T. Schoder, J. Westhauser, and C. Wu, "Fabrication of gray-scale masks and diffractive optical elements with LDW glass," in Lithographic and Micromachining Techniques for Optical Component Fabrication, E. B. Kley and H. P. Herzig, eds., Proc. SPIE 4440, 73-84 (2001).
2. C. Pruss, S. Reichelt, H. J. Tiziani, and V. P. Korolkov, "Metrological features of diffractive high-efficiency objectives for laser interferometry," in Seventh International Symposium on Laser Metrology Applied to Science, Industry, and Everyday Life, Y. V. Chugui, S. N. Bagayev, A. Weckenmann, and P. H. Osanna, eds., Proc. SPIE 4900, 873-884 (2002).
3. M. Kuittinen, H. P. Herzig, and P. Ehbets, "Improvements in diffraction efficiency of gratings and microlenses with continuous relief structures," Opt. Commun. 120, 230-234 (1995).
4. M. Ekberg, F. Nikolaeff, M. Larson, and S. Härd, "Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithography," Appl. Opt. 33, 103-107 (1994).
5. T. Hessler, M. Rossi, R. E. Kunz, and M. T. Gale, "Analysis and optimization of fabrication of continuous-relief diffractive optical elements," Appl. Opt. 37, 4069-4079 (1998).
6. W. V. Spiegel, S. Stankovic, M. Budach, and D. Dias, "Fabrication, optimization and measurement of microstructures for optical applications," in Annual Report 2000/01, Microoptical Systems (Institut fuer Angewandte Physik, 2001), pp. 69-70.
7. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, "Characterization of positive photoresist," IEEE Trans. Electron. Devices ED-22, 445-452 (1975).
8. C. A. Mack, "New kinetic model for resist dissolution," J. Electrochem. Soc. 139, L35-L37 (1992).
9. S. A. Robertson, E. K. Pavelchek, W. Hoppe, and R. Wildfeuer, "Improved notch model for resist dissolution in lithography simulation," in Advances in Resist Technology and Processing XVIII, F. M. Houlihan, ed., Proc. SPIE 4345, 108-117 (2001).
10. W. Goltsos and S. Liu, "Polar coordinate laser writer for binary optics fabrication," in Computer and Optically Formed Holographic Optics, I. Cindrich and S. H. Lee, eds., Proc. SPIE 1211, 137-147 (1990).
11. J. P. Bowen, R. L. Michaels, and C. G. Blough, "Generation of large-diameter diffractive elements with laser pattern generation," Appl. Opt. 36, 8970-8975 (1997).
12. E. Rasmussen, "A new plotter for small structures," in Optics and Fluid Department Annual Progress Report for 2000, S. H. Hanson, P. M. Johansen, J. P. Lunov, and B. Scaarup, eds., (Risø National Laboratory, 2001), pp. 11-12.
13. A. G. Poleshchuk, E. G. Churin, V. P. Koronkevich, V. P. Korolkov, A. A. Kharissov, V. V. Cherkashin, V. P. Kiryanov, A. V. Kiryanov, S. A. Kokarev, and A. G. Verhoglyad, "Polar coordinate laser pattern generator for fabrication of diffractive optical elements with arbitrary structure," Appl. Opt. 38, 1295-1301 (1999).
14. A. G. Poleshchuk, V. P. Korolkov, V. V. Cherkashin, S. Reich elt, and J. Burge, "Methods for minimizing the errors in direct laser writing of diffractive optical elements," Optoelectron. Instrum. Process. (Avtometriya) 3, 3-15 (2002).
15. M. T. Gale and K. Knop, "Fabrication of fine lens array by laser beam writing," in Industrial Applications of Laser Technology, W. F. Fagan, ed., Proc. SPIE 398, 347-353 (1983).
16. M. Haruna, M. Takahashi, K. Wakahayashi, and H. Nishihara, "Laser beam lithographed micro-Fresnel lenses," Appl. Opt. 29, 5120-5126 (1990).
17. M. T. Gale, M. Rossi, H. Schütz, P. Ehberts, H. P. Herzig, and D. Pronque, "Continuous-relief diffractive optical elements for two-dimensional array generation," Appl. Opt. 32, 2526-2533 (1993).
18. H. Anderson, M. Ekberg, S. Hard, S. Jacobsson, M. Larsson, and T. Nilsson, "Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation," Appl. Opt. 29, 4259-4264 (1990).
19. B. Kress and P. Meyrueis, Digital Diffractive Optics: An Introduction to Planar Diffractive Optics and Related Technology (John Wiley, 2000).