Formation of (111) nanotwin lamellae hillocks in polycrystalline silicon thin films caused by deposition of silicon dioxide layer

Applied Physics Letters

Volumn 88, Issue 2, 2006, Pages 1-3

  Imai, Shigeki ^a   Fujimoto, Masayuki ^b  

^a SHARP CORPORATION   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; GRAIN BOUNDARIES; HIGH TEMPERATURE APPLICATIONS; POLYCRYSTALLINE MATERIALS; SILICON; SURFACE PHENOMENA;

FILM SURFACE; NANOTWIN LAMELLAE HILLOCKS; SILICON DIOXIDE LAYER;

THIN FILMS;

EID: 30744436538     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2162681     Document Type: Article

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