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Volumn 862, Issue , 2005, Pages 87-92

Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by VHF PECVD

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN; ION BOMBARDMENT; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; SOLAR CELLS;

EID: 30644479889     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-862-a10.3     Document Type: Conference Paper
Times cited : (9)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.