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Volumn 862, Issue , 2005, Pages 87-92
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Influence of pressure and plasma potential on high growth rate microcrystalline silicon grown by VHF PECVD
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Author keywords
[No Author keywords available]
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Indexed keywords
HYDROGEN;
ION BOMBARDMENT;
PLASMA APPLICATIONS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SILICON;
SOLAR CELLS;
MEAN FREE PATH;
PLASMA POTENTIAL;
PLASMA POWER;
CRYSTALLINE MATERIALS;
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EID: 30644479889
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-862-a10.3 Document Type: Conference Paper |
Times cited : (9)
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References (18)
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