RF MEMS tunable capacitors with large tuning ratio

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2004, Pages 777-780

  Rijks, Th G S M ^a   Van Beek, J T M ^a   Steeneken, P G ^a   Ulenaers, M J E ^a   De Coster, J ^b   Puers, R ^b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM ALLOYS; BIPOLAR SEMICONDUCTOR DEVICES; CAPACITANCE; CAPACITORS; ELECTROSTATICS; ENERGY UTILIZATION; NATURAL FREQUENCIES; PASSIVATION; THIN FILMS; TUNING; VARACTORS; VOLTAGE CONTROL;

ACTUATION VOLTAGES; POWER CONSUMPTION; RADIO FREQUENCY (RF) APPLICATIONS; TUNABLE CAPACITORS;

MICROELECTROMECHANICAL DEVICES;

EID: 3042826618     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)

1. C. T.-C. Nguyen, L.P.B. Katehi, and G.M. Rebeiz, "Micromachined devices for wireless communications", Proc. IEEE 86 (8), 1998, 1756.
2. A. Dec and K. Suyama, "Micromachined electromechanically tunable capacitors and their applications to RF IC's", IEEE Trans. Microwave Theory and Techn. 46(12), 1998, 2587.
3. J. Ehmke, J. Brank, A. Malczewski, B. Pillans, S. Eshelman, J. Yao, and C. Goldsmith, "RF MEMS devices: a brave new world for RF technology", IEEE Emerging Technologies Symp.2000: Wireless Internet Access, April 10-11, 2000.
4. J.J.Yao, "RF MEMS from a device perspective", J. Micromech. Microeng. 10, 2000, R9.
5. K. Shen, F. P. S. Hui, W.M.Y. Wong, Z. Chen, J. Lau, P.C.H. Chan, and P.K. Ko, "A three terminal SOI gated varactor for RF applications", IEEE Trans. Elec. Dev. 48 (2), 2001, 289.
6. J. Zou, C.Liu, J. Schutt-Aine, J.H. Chen, and S.M. Kang, "Development of a wide-tuning range MEMS tunable capacitor for wireless communications systems", IEDM Tech. Dig., 2000, 403.
7. H. Nieminen, V. Ermolov, K. Nybergh, S. Silanto, and T. Ryhänen, "Micromechanical capacitors for RF applications", J. Micromech. Microeng. 12, 2002, 177.
8. Z. Xiao, W. Peng, R.F. Wolffenbuttel, and K.R. Farmer, "Micromachined variable capacitors with wide tuning range", Proc. Solid State Sensor, Actuator, and Microsystems Workshop, Hilton Head Island, South Carolina, June 2-6, 2002, 346.
9. th Int. Conf. on Solid-State Sensors, Actuators and Microsystems June 9-12, 2003, Vol. 2, 1784.
10. D. Peroulis and L.P.B. Katehi, "Electrostatically-tunable analog RF MEMS varactors with measured capacitance range of 300%", IEEE MTT-S Digest, 2003, 1793.
11. R.L. Borwick III, P.A. Stupar, J.F. DeNatale, R. Anderson, and R. Erlandson, "Variable MEMS capacitors implemented into RF filter systems", IEEE Trans. Microwave Theory and Techn. 51 (1), 2003, 315.
12. T.K. Tsang, M.N. El-Gamal, W.S. Best, and H.J. De Los Santos, "Wide tuning range RF MEMS varactors fabricated using the PolyMUMPS foundry", Microwave Journal, Aug. 2003, 22.
13. N. Pulsford, "Passive integration technologies: targeting small accurate RF parts", RF Design Nov. 2002, 40.
14. J.T.M. van Beek, M.H.W.M. van Delden, A. van Dijken, P. van Eerd, M. van Grootel, A.B.M. Jansman, A.L.A.M. Kemmeren, Th.G.S.M. Rijks, P.G. Steeneken, J. den Toonder, M. Ulenaers, A. den Dekker, P. Lok, N. Pulsford, F. van Straten, L. van Teeffelen, J. De Coster, and R. Puers, "High-Q integrated RF passives and micro-mechanical capacitors on silicon", Proceedings BCTM 2003, Sept. 28 - 30, Toulouse, France.
15. Th.G.S.M. Rijks, J.T.M. van Beek, M.J.E. Ulenaers, J. De Coster, R. Puers, A. den Dekker, and L. van Teeffelen, "Passive Integration and RF MEMS: a toolkit for adaptive LC circuits", Digest ESSCIRC 2003, Estoril, Portugal, Sept. 16-18 2003, 269.
16. A.B.M. Jansman, J.T.M. van Beek, M.H.W.M. van Delden, A.L.A.M. Kemmeren, A. den Dekker, and F.P. Widdershoven, "Elimination of accumulation charge effects for High-Resistive Silicon Substrates", Digest ESSDERC 2003, Estoril, Portugal, Sept. 16-18, 2003.