Nanoporous SiLK® dielectric films prepared from free-radical graft polymerization and thermolysis

Macromolecular Chemistry and Physics

Volumn 206, Issue 24, 2005, Pages 2483-2489

  Chen, Yiwang ^a   Chen, Lie ^a   Wang, Xiaofeng ^a   He, Xiaohui ^a  

^a NANCHANG UNIVERSITY   (China)

Author keywords

Dielectric properties; Graft copolymers; Nanotechnology; XPS

Indexed keywords

CROSSLINKING; DIELECTRIC FILMS; DIELECTRIC PROPERTIES; GRAFT COPOLYMERS; NANOTECHNOLOGY; PERMITTIVITY; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

POLY(ETHYLENE GLYCOL) METHYL METHACRYLATE (PEGMA); SPIN-CASTING; THERMOLYSIS;

NANOSTRUCTURED MATERIALS;

EID: 30144446171     PISSN: 10221352     EISSN: None     Source Type: Journal    
DOI: 10.1002/macp.200500371     Document Type: Article

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