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Applied Physics Letters

Volumn 84, Issue 21, 2004, Pages 4254-4256

Electric field and temperature-induced removal of moisture in nanoporous organosilicate films

(3) Biswas, N a,c Lubguban, J A b Gangopadhyay, S b

a TEXAS TECH UNIVERSITY (United States)

b University of Missouri (United States)

c North Carolina State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASHING; METHYLSILSESQUIOXANE; NANOPOROUS ORGANOSILICATES; RE-ADSORPTION;

ABSORPTION; DEHYDRATION; DOPING (ADDITIVES); ETCHING; HYDROGEN BONDS; HYDROPHOBICITY; HYDROXYLATION; INTEGRATED CIRCUITS; MIS DEVICES; MOISTURE CONTROL; ORGANIC COMPOUNDS; PERMITTIVITY; POROUS MATERIALS; SILICON; SURFACE PHENOMENA; VAPORIZATION;

SILICATES;

EID: 2942666147 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1757019 Document Type: Article

Times cited : (14)

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