Layout design methodologies for sub-wavelength manufacturing

Proceedings - Design Automation Conference

Volumn , Issue , 2001, Pages 85-88

  Rieger, Michael L ^a   Mayhew, Jeffrey P ^a   Panchapakesan, Sridhar ^b  

^a Avant Corporation   (United States)

^b SYNOPSYS INC   (United States)

Author keywords

Lithography; OPC; Optical proximity correction; Phase shift mask; PSM

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; DYNAMIC RANDOM ACCESS STORAGE; INTEGRATED CIRCUIT LAYOUT; PHASE SHIFT; WSI CIRCUITS;

PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0034843239     PISSN: 0738100X     EISSN: None     Source Type: Journal    
DOI: 10.1109/DAC.2001.156113     Document Type: Article

References (13)

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2. A practical approach to control full chip level gate CD in DUV lithography
3. Advanced technology for extending optical lithography
4. Improving resolution in photolithography with a phase-shifting mask
5. New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout
6. The application of alternating phase-shifting masks…
7. Multilevel imaging system realizing k1=0.3 lithography
8. 100-nm node lithography with KrF?
9. Pahse phirst! An improved strong-PSM paradigm
10. Phase shifting mask strategies: Isolated dark lines
11. Optimization of dipole off-axis illumination …
12. TCAD physical verification for reticle enhancement techniques