Subwavelength lithography and its potential impact on design and EDA

Proceedings - Design Automation Conference

Volumn , Issue , 1999, Pages 799-804

  Kahng, Andrew B ^a   Pati, Y C ^a  

^a University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; MASKS; PHOTOLITHOGRAPHY;

OPTICAL PROXIMITY CORRECTION (OPC); PHASE SHIFTING MASKS (PSM); SUBWAVELENGTH LITHOGRAPHY;

CMOS INTEGRATED CIRCUITS;

EID: 0032674029     PISSN: 0738100X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1145/309847.310072     Document Type: Conference Paper

References (34)