Bias enhanced sensitivity in amorphous/porous silicon heterojunction gas sensors

Journal of Non-Crystalline Solids

Volumn 338-340, Issue 1 SPEC. ISS., 2004, Pages 776-779

  Tucci, M ^a   La Ferrara, V ^a   Della Noce, M ^a   Massera, E ^a   Quercia, L ^a  

^a ENEA CR Portici   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; CURRENT DENSITY; ELECTROCHEMISTRY; ETCHING; HETEROJUNCTIONS; OHMIC CONTACTS; PHOTOLUMINESCENCE; SILICON; THICKNESS MEASUREMENT; THIN FILMS; ULTRAVIOLET LAMPS;

CLIMATIC CHAMBERS; GAS EXPOSURE; MASS FLOW CONTROL (MFC); SILICON SUBSTRATES;

CHEMICAL SENSORS;

EID: 2942618522     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2004.03.089     Document Type: Conference Paper

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